Plasma Processing of Nanomaterials (Record no. 2305)

MARC details
000 -LEADER
fixed length control field 02998 a2200349 4500
001 - CONTROL NUMBER
control field 1138077437
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20250317100411.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 250312042017xx 186 eng
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781138077430
037 ## - SOURCE OF ACQUISITION
Source of stock number/acquisition Taylor & Francis
Terms of availability GBP 78.99
Form of issue BB
040 ## - CATALOGING SOURCE
Original cataloging agency 01
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
072 7# - SUBJECT CATEGORY CODE
Subject category code TJF
Source thema
072 7# - SUBJECT CATEGORY CODE
Subject category code PHFP
Source thema
072 7# - SUBJECT CATEGORY CODE
Subject category code TGM
Source thema
072 7# - SUBJECT CATEGORY CODE
Subject category code THR
Source thema
072 7# - SUBJECT CATEGORY CODE
Subject category code TJF
Source bic
072 7# - SUBJECT CATEGORY CODE
Subject category code PHFP
Source bic
072 7# - SUBJECT CATEGORY CODE
Subject category code TGM
Source bic
072 7# - SUBJECT CATEGORY CODE
Subject category code THR
Source bic
072 7# - SUBJECT CATEGORY CODE
Subject category code SCI055000
Source bisac
072 7# - SUBJECT CATEGORY CODE
Subject category code TEC007000
Source bisac
072 7# - SUBJECT CATEGORY CODE
Subject category code TEC008070
Source bisac
072 7# - SUBJECT CATEGORY CODE
Subject category code TEC021000
Source bisac
072 7# - SUBJECT CATEGORY CODE
Subject category code 620.5
Source bisac
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name R. Mohan Sankaran
245 10 - TITLE STATEMENT
Title Plasma Processing of Nanomaterials
250 ## - EDITION STATEMENT
Edition statement 1
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. CRC Press
Date of publication, distribution, etc. 20170331
300 ## - PHYSICAL DESCRIPTION
Extent 430 p
520 ## - SUMMARY, ETC.
Expansion of summary note We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

No items available.